Pattern recognition based on specifically trained machine learning algorithms is applied to strongly enhance the capabilities of in-situ electron beam lithography. This is applied to integrate single InGaAs quantum dots into circular Bragg grating resonators, with an optimized device design derived using JCMsuite.
J. Donges et al. Machine learning enhanced in situ electron beam lithography of photonic nanostructures. Nanoscale 14, 14529 (2022).