A polarization-resolved analysis of the scattered EUV radiation to increase the sensitivity and minimize the uncertainties in the reconstruction of EUV Scattering is presented.
Victor Soltwisch, et al., Opportunities of polarization-resolved EUV scatterometry on photomasks. Proc. SPIE 12802, 38th European Mask and Lithography Conference (EMLC 2023), 128020G (2023).
DOI: 10.1117/12.2675921