Quantitative optical imaging for in-die-capable critical dimension targets

FEM simulations are used in a work by U.S. National Institute of Standards and Technology to optimize the design of in-die-capable metrology targets for process control in microlithography.

B. M. Barnes, et al. Enabling quantitative optical imaging for in-die-capable critical dimension targets. Proc. SPIE 9778, 97780Y (2016).

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