FEM simulations are used in a work by U.S. National Institute of Standards and Technology to optimize the design of in-die-capable metrology targets for process control in microlithography.

B. M. Barnes, et al. Enabling quantitative optical imaging for in-die-capable critical dimension targets. Proc. SPIE 9778, 97780Y (2016).

DOI: 10.1117/12.2221920