This work demonstrates a hybrid metrology technique combining soft X-ray scattering and fluorescence to reconstruct the dimensions of a silicon nitride nanoscale grating with high accuracy. To solve the inverse problem, the electric field strength of the standing wave field within the grating was calculated using JCMsuite’s finite element method solver. These near-field calculations were then used to compute diffraction efficiencies and fluorescence intensities, which were fitted to experimental data via an optimization process to determine the grating profile parameters.
L. M. Lohr, et al. Hybrid approach to reconstruct nanoscale grating dimensions using scattering and fluorescence with soft X-rays. Nanoscale, 17, 6017 (2025).
DOI: 10.1039/d4nr04580g
